Tailoring optical and electrical properties of thin-film coatings based on mixed Hf and Ti oxides for optoelectronic application
Author:
Funder
Polish National Science Centre
Publisher
Elsevier BV
Subject
Mechanical Engineering,Mechanics of Materials,General Materials Science
Reference65 articles.
1. A low gate leakage current and small equivalent oxide thickness MOSFET with Ti/HfO2 high-k gate dielectric;Fu;Microelectron. Eng.,2011
2. Annealing temperature modulated interfacial chemistry and electrical characteristics of sputtering-derived HfO2/Si gate stack;Gao;J. Alloy. Compd.,2015
3. Microstructure, optical and electrical properties of sputtered HfTiO high-k gate dielectric thin films;Jiang;Ceram. Int.,2016
4. Interface engineering and chemistry of Hf-based high-k dielectrics on III-V substrates;He;Surf. Sci. Rep.,2013
5. Modulating the interface quality and electrical properties of HfTiO/InGaAs gate stack by atomic-layer-deposition-derived Al2O3 passivation layer;He;ACS Appl. Mater. Interfaces,2014
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