Reduced amount of contamination particle generated by CF4/Ar/O2 plasma corrosion of Y2O3 materials: Influence of defluorination process

Author:

Kim Minjoong,Choi Eunmi,So Jongho,Maeng Seonjeong,Chung Chin-Wook,Suh Song-Moon,Yun Ju-Young

Funder

Korea Research Institute of Standards and Science

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference47 articles.

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4. Reduction of particle contamination in plasma-etching equipment by dehydration of chamber wall, Jpn;Ito;J. Appl. Phys.,2008

5. Yield enhancement through defect reduction for post wet silicon nitride etch applications;Dries;IEEE Int. Symp. Semicond. Manuf. Conf. Proc.,2004

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