Fabrication of high aspect ratio AlN nanopillars by top-down approach combining plasma etching and wet etching
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Published:2024-10
Issue:
Volume:181
Page:108615
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ISSN:1369-8001
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Container-title:Materials Science in Semiconductor Processing
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language:en
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Short-container-title:Materials Science in Semiconductor Processing
Author:
Jaloustre LucasORCID,
Sales De Mello Saron,
Labau Sébastien,
Petit-Etienne Camille,
Pargon Erwine