Effect of heat treatment on electrical and surface properties of tungsten oxide thin films grown by HFCVD technique-Reference-Cited by-同舟云学术

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Effect of heat treatment on electrical and surface properties of tungsten oxide thin films grown by HFCVD technique

Published:2021-02 Issue: Volume:122 Page:105506
ISSN:1369-8001
Container-title:Materials Science in Semiconductor Processing
language:en
Short-container-title:Materials Science in Semiconductor Processing

Author:

Tan Guang-Lei,Tang Dan,Dastan Davoud,Jafari Azadeh,Silva José P.B.,Yin Xi-Tao

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference66 articles.

1. Synthesis and Surface Modification of TiO2-Based Photocatalysts for the Conversion of CO2

2. Layer-structured BaTiO3/P(VDF–HFP) composites with concurrently improved dielectric permittivity and breakdown strength toward capacitive energy-storage applications

3. CO2 capture and separation on charge-modulated calcite

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