Laser induced dielectric breakdown in reactive mixture SiF4 + H2-Reference-Cited by-同舟云学术

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Laser induced dielectric breakdown in reactive mixture SiF4 + H2

Published:2021-05 Issue: Volume:179 Page:106099
ISSN:0584-8547
Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
language:en
Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Sennikov P.G.,Ermakov A.A.,Kornev R.A.,Gornushkin I.B.

Funder

Russian Science Foundation

Ministry of Education and Science of the Russian Federation

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference58 articles.

1. Electrical and optical properties of amorphous Si:F:H alloys;Madan;Philos. Mag. B,1978

2. A new amorphous silicon-based alloy for electronic applications;Ovchinsky;Nature,1978

3. Novel approaches to plasma deposition of amorphous silicon-based materials;Bruno;Pure Appl. Chem.,1992

4. Plasma deposition of amorphous silicon alloys from fluorinated gases;Cicala;Pure Appl. Chem.,1996

5. Plasma enhanced chemical vapor deposition of amorphous, polymorphous and microcrystalline silicon films;Roca i Cabarrocas;J. Non-Cryst. Solids,2000

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1. A review of processes for separation and utilization of fluorine from phosphoric acid and phosphate fertilizers;Chemical Papers;2022-06-28

2. Anti-Coking Performance of Ethyl Benzene Pyrolysis of Silicon-Based Films Prepared through Plasma-Enhanced Chemical Vapour Deposition;Silicon;2022-01-03

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