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Vapor phase treatment–total reflection X-ray fluorescence for trace elemental analysis of silicon wafer surface

  • Published:2013-12 Issue: Volume:90 Page:72-82
  • ISSN:0584-8547
  • Container-title:Spectrochimica Acta Part B: Atomic Spectroscopy
  • language:en
  • Short-container-title:Spectrochimica Acta Part B: Atomic Spectroscopy

Author:

Takahara Hikari,Mori Yoshihiro,Shibata Harumi,Shimazaki Ayako,Shabani Mohammad B.,Yamagami Motoyuki,Yabumoto Norikuni,Nishihagi Kazuo,Gohshi Yohichi

Publisher

Elsevier BV

Subject

Spectroscopy,Instrumentation,Atomic and Molecular Physics, and Optics,Analytical Chemistry

Reference10 articles.

1. Total-Reflection X-Ray Fluorescence Analysis;Klockenkaemper,1997

2. Total reflection X-ray fluorescence and grazing incidence X-ray spectrometry — tools for micro- and surface analysis. A review;Bohlen;Spectrochim. Acta Part B,2009

3. Enhanced analysis of particles and vapor phase decomposition droplets by total-reflection X-ray fluorescence;Funahashi;Spectrochim. Acta Part B,1999

4. Analysis of low metallic contamination on silicon wafer surface by vapor phase treatment and total reflection X-ray fluorescence analysis;Shimazaki;Jpn. J. Appl. Phys.,2006

5. Proc. Int. Symp. Semiconductor Manufacturing, San Jose, 2005, IEEE, Piscataway;Shimazaki,2005

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