The magnetron-activated deposition process-Reference-Cited by-同舟云学术

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The magnetron-activated deposition process

Published:1995-12 Issue: Volume:76-77 Page:763-769
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Reschke J.,Goedicke K.,Schiller S.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference12 articles.

1. Proc. 7th Int. Conf. on Vacuum Web Coating;Schiller,1993

2. Proc. 8th Int. Conf. on Vacuum Web Coating;Affinito,1994

3. Proc. 8th Int. Conf. on Vacuum Web Coating;Staffetti,1994

4. Proc. 37th Annu. Technical Conf. on SVC;Schiller,1994

5. Proc. 36th Annu. Technical Conf. on SVC;Schiller,1993

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. New approaches to plasma enhanced sputtering of advanced hard coatings;Surface and Coatings Technology;2007-02

2. Formability and corrosion properties of metal/ceramic multilayer coated strip steels;Surface and Coatings Technology;1998-11

3. Recent Results on Reactive Magnetron Sputtering for High-Rate Deposition of Ceramic Compound Films;Materials Science Forum;1998-08

4. Ion Plating and Ion Beam Assisted Deposition;Handbook of Physical Vapor Deposition (PVD) Processing;1998

5. Physical Sputtering and Sputter Deposition (Sputtering);Handbook of Physical Vapor Deposition (PVD) Processing;1998

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