Influence of the deposition gas on the properties of plasma-deposited carbonized layers-Reference-Cited by-同舟云学术

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Influence of the deposition gas on the properties of plasma-deposited carbonized layers

Published:1991-05 Issue:1-3 Volume:45 Page:353-358
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Boutard D.,Mo¨ller W.

Publisher

Elsevier BV

Reference19 articles.

1. Plasma Deposited Thin Films;Angus,1985

2. Structure and physical properties of plasma-grown amorphous hydrogenated carbon films

3. Characterization of diamondlike carbon films and their application as overcoats on thin-film media for magnetic recording

4. Structure property relationships of carbonaceous films grown under ion enhancement

5. Positive-ion bombardment of substrates in rf diode glow discharge sputtering

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pressure and power dependence of self-bias, sheath thickness, and deposition rate in confined methane plasmas at 13.56 MHz;Applied Physics Letters;1996-08-05

2. Influence of the ion energy on the growth and structure of thin hydrocarbon films;Journal of Applied Physics;1993-07-15

3. Ion energy distributions from electron cyclotron resonance methane plasmas;Diamond and Related Materials;1993-03

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