Deposition and characterization of ternary thin films within the Ti–Al–C system by DC magnetron sputtering-Reference-Cited by-同舟云学术

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Deposition and characterization of ternary thin films within the Ti–Al–C system by DC magnetron sputtering

Published:2006-05 Issue:1 Volume:291 Page:290-300
ISSN:0022-0248
Container-title:Journal of Crystal Growth
language:en
Short-container-title:Journal of Crystal Growth

Author:

Wilhelmsson O.,Palmquist J.-P.,Lewin E.,Emmerlich J.,Eklund P.,Persson P.O.Å.,Högberg H.,Li S.,Ahuja R.,Eriksson O.,Hultman L.,Jansson U.

Publisher

Elsevier BV

Subject

Materials Chemistry,Inorganic Chemistry,Condensed Matter Physics

Reference50 articles.

1. Synthesis and Characterization of Ti3AlC2

2. Die Kristallstruktur von Ti3SiC2—ein neuer Komplexcarbid-Typ

3. Strukturchemie einiger Verbindungen der Übergangsmetalle mit den elementen C, Si, Ge, Sn

4. The MAX Phases: Unique New Carbide and Nitride Materials

5. The MN+1AXN phases: A new class of solids

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4. Sputtering yields of TiC and MAX phase Ti2AlC using Ne, Ar, Xe ions;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;2024-09

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