TCR control of Ni–Cr resistive film deposited by DC magnetron sputtering
Author:
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference18 articles.
1. Applications of resistive thin films in electronics
2. Microstructure and electrical characteristics of Cr–Si–Ni films deposited on glass and Si (100) substrates by RF magnetron sputtering
3. Electrical Properties of Ni–Cr–N Thin Films Deposited by Multitarget Reactive Sputtering
4. Structural and Electrical Properties of NiCr Thin Films Annealed at Various Temperatures in a Vacuum and a Nitrogen Ambient for π-Type Attenuator Applications
5. The effects of the process parameters on the electrical and microstructure characteristics of the CrSi thin resistor films: part I
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