The photoemission study of InSb/HfO2 stacks upon N2 rapid thermal annealing

Author:

Sun Yong,Chen Jinxin,Wang Tao,Wang Xinglu,Feng Ze,Liu Chen,Zhao Jiali,Lu Feng,Cheng Yahui,Wang Wei-Hua,Wang Weichao,Liu Hui,Cho Kyeongjae,Wu Rui,Wang Jiaou,Lu Hongliang,Dong Hong

Funder

National Natural Science Foundation of China

Fundamental Research Funds for the Central Universities

State Key Laboratory of Low-Dimensional Quantum Physics

State Key Laboratory of ASIC & System

Fudan University

Tianjin Natural Science Foundation

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference40 articles.

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3. Highly-strained mid-infrared type-I diode lasers on GaSb;Sifferman;IEEE J. Sel. Top. Quantum Electron.,2015

4. High-performance 40nm gate length InSb p-channel compressively strained quantum well field effect transistors for low-power (Vcc=0.5V) logic applications;Radosavljevic;Int. Electron Devices Mett,2008

5. Compressively strained InSb MOSFETs with high hole mobility for p-channel application;Barth,2013

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