Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study-Reference-Cited by-同舟云学术

Oxygen plasma cleaning of copper for photocathode applications: A MEIS and XPS study

Published:2022-11 Issue: Volume:205 Page:111424
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Noakes T.C.Q.^ORCID,Valizadeh R.,Hannah A.N.^ORCID,Jones L.B.^ORCID,Militsyn B.L.,Mistry S.^ORCID,Cropper M.D.,Rossall A.^ORCID,Van den Berg J.A.^ORCID

Funder

Science and Technology Facilities Council

UK National Ion Beam Centre

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference24 articles.

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