Comparison of a-C:N:H layers grown at the anode and cathode in RF-PACVD processing
Author:
Funder
AGH-UST
Publisher
Elsevier BV
Subject
Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation
Reference27 articles.
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2. A role of parameters in RF PA CVD technology of a-C: N:H layers;Kyzioł;Vacuum,2008
3. Interface features of carbon nitrided films deposited on Si substrate;Liu;Vacuum,2016
4. Study of adhesion of carbon nitride thin films on medical alloy substrates;Marton;Vacuum,2010
5. Synthesis and optical characterization of amorphous carbon nitride thin films by hot filament assisted RF plasma CVD;Kundoo;Vacuum,2003
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1. Nitrogen-modified a-C:H layers applied for light emitting diodes;Vacuum;2022-11
2. Optical method for homogeneity testing of thin films electrodes for photovoltaic cells;PRZEGLĄD ELEKTROTECHNICZNY;2022-09-05
3. Thermo-optical properties of hydrogenated amorphous carbon and nitrogen-modified carbon layers from in situ ellipsometric studies;Journal of Materials Research and Technology;2020-03
4. Adhesion of hydrogenated amorphous carbon films on ferrous alloy by intermediate nitrogen plasma treatment in silicon-containing interlayers;Vacuum;2019-09
5. Structural and optical characterization of carbon nitride layers deposited by plasma assisted chemical vapor deposition at various conditions;Thin Solid Films;2018-01
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