Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films-Reference-Cited by-同舟云学术

Influence of nitrogen content on the structural, mechanical and electrical properties of TiN thin films

Published:2005-02 Issue:2-3 Volume:191 Page:317-323
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Vaz F.,Ferreira J.,Ribeiro E.,Rebouta L.,Lanceros-Méndez S.,Mendes J.A.,Alves E.,Goudeau Ph.,Rivière J.P.,Ribeiro F.,Moutinho I.,Pischow K.,de Rijk J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference47 articles.

1. Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings

2. Process controlled microstructural and binding properties of hard physical vapor desposition films

3. Role of ions in ion-based film formation

4. Ion-based methods for optical thin film deposition

5. A model for development of orientation of vapour deposits

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