Microstructure modifications of CrN coatings by pulsed bias sputtering
Author:
Funder
Austrian Research Promotion Agency FFG
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference30 articles.
1. Revised structure zone model for thin film physical structure
2. Polycrystalline TiN films deposited by reactive bias magnetron sputtering: Effects of ion bombardment on resputtering rates, film composition, and microstructure
3. Low energy ion assist during deposition — an effective tool for controlling thin film microstructure
4. Recent advances in magnetron sputtering technology
5. Influence of ion bombardment on structure and properties of unbalanced magnetron grown CrNx coatings
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2. Chromium arc plasma characterization, structure and properties of CrN coatings prepared by vacuum arc evaporation;Vacuum;2023-03
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5. On the Microstructure and Mechanical Properties of CrNx/Ag Multilayer Films Prepared by Magnetron Sputtering;Materials;2020-03-13
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