Is it meaningful to quantify vacancy concentrations of nanolamellar (Ti,Al)N thin films based on laser-assisted atom probe data?-Reference-Cited by-同舟云学术

Is it meaningful to quantify vacancy concentrations of nanolamellar (Ti,Al)N thin films based on laser-assisted atom probe data?

Published:2023-11 Issue: Volume:473 Page:130020
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Hans Marcus,Tkadletz Michael,Primetzhofer Daniel,Waldl Helene,Schiester Maximilian,Bartosik Matthias,Czettl Christoph,Schalk Nina,Mitterer Christian,Schneider Jochen M.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference48 articles.

1. Thermal stability of arc evaporated high aluminum-content Ti1-xAlxN thin films;Hörling;J. Vac. Sci. Technol. A,2002

2. Self-organized nanostructures in the Ti–Al–N system;Mayrhofer;Appl. Phys. Lett.,2003

3. Spinodal decomposition of reactively sputtered (V0.64Al0.36)0.49N0.51 thin films;Hans;Surf. Coat. Technol.,2020

4. Probing the onset of wurtzite phase formation in (V,Al)N thin films by transmission electron microscopy and atom probe tomography;Hans;Surf. Coat. Technol.,2022

5. Three-dimensional atom probe investigations of Ti–Al–N thin films;Rachbauer;Scr. Mater.,2009

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