Conditions for nucleation and growth in the substrate boundary layer at plasma spray-physical vapor deposition (PS-PVD)
Author:
Publisher
Elsevier BV
Subject
Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry
Reference59 articles.
1. Plasma spray-PVD: a new thermal spray process to deposit out of the vapor phase;von Niessen;J. Therm. Spray Technol.,2011
2. Plasma characteristics and plasma-feedstock interaction under PS-PVD process conditions;Mauer;Plasma Chem. Plasma Process.,2014
3. Vapor phase deposition using plasma spray-PVD;von Niessen;J. Therm. Spray Technol.,2010
4. Characteristics of ceramic coatings made by thin film low pressure plasma spraying (LPPS-TF);Hospach;J. Therm. Spray Technol.,2012
5. Process development and coating characteristics of plasma spray-PVD;Mauer;Surf. Coat. Technol.,2013
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