Simulation of heating of the target during high-power impulse magnetron sputtering-Reference-Cited by-同舟云学术

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Simulation of heating of the target during high-power impulse magnetron sputtering

Published:2018-01 Issue: Volume:334 Page:269-273
ISSN:0257-8972
Container-title:Surface and Coatings Technology
language:en
Short-container-title:Surface and Coatings Technology

Author:

Karzin V.V.,Komlev A.E.,Karapets K.I.,Lebedev N.K.

Funder

Russian Science Foundation

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics,General Chemistry

Reference21 articles.

1. Alfvén's critical ionization velocity observed in high power impulse magnetron sputtering discharges

2. Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge

3. High-current impulse magnetron discharge with liquid target

4. Deposition of Zr–ZrOX and Y–YXOY films by reactive magnetron sputtering

5. On surface temperatures during high power pulsed magnetron sputtering using a hot target

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1. Modeling of reactive sputtering and evaporation in a hot-target magnetron discharge;8th International Congress on Energy Fluxes and Radiation Effects;2022-11-14

2. On the Control of Hot Nickel Target Magnetron Sputtering by Distribution of Power Pulses;Coatings;2022-07-19

3. High-precision modeling of dynamic etching in high-power magnetron sputtering;Journal of Physics D: Applied Physics;2022-05-31

4. Properties of Ti-oxide thin films grown in reactive magnetron sputtering with self-heating target;Vacuum;2022-03

5. The sputtering of titanium magnetron target with increased temperature in reactive atmosphere by gas injection magnetron sputtering technique;Applied Surface Science;2022-02

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