Predeposition plasma treatment of InSb surface in pecvd SiO2-InSb Structures
Author:
Publisher
Elsevier BV
Reference11 articles.
1. Characterization of improved InSb interfaces
2. XPS study of interface formation of CVD SiO2 on InSb
3. Plasma-enhanced chemically vapour-deposited silicon dioxide for metal/oxide/semiconductor structures on InSb
4. Hysteresis free SiO2/InSb metal-insulator-semiconductor diodes
5. Improvements in GaAs/plasma-deposited silicon nitride interface quality by predeposition GaAs surface treatment and postdeposition annealing
Cited by 5 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Characterization and preparation of SiO2and SiOF films using an RF PECVD technique from TEOS/O2and TEOS/O2/CF4precursors;Journal of Physics D: Applied Physics;2004-08-20
2. SiO2 films deposited on silicon at low temperature by plasma-enhanced decomposition of hexamethyldisilazane: Defect characterization;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;2001-09
3. Investigation of low temperature SiO2 plasma enhanced chemical vapor deposition;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures Processing, Measurement, and Phenomena;1996-03-01
4. Investigation of SiO2 plasma enhanced chemical vapor deposition through tetraethoxysilane using attenuated total reflection Fourier transform infrared spectroscopy;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1995-09-01
5. Low-temperature plasma enhanced chemical vapor deposition of SiO2;Applied Physics Letters;1994-12-19
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.7亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2025 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3