Short-term copper intrauterine device placement improves the implantation and pregnancy rates in women with repeated implantation failure
Author:
Funder
National Nature Science Foundation of China
Natural Science Foundation of Shanghai
Publisher
Elsevier BV
Subject
Obstetrics and Gynecology,Reproductive Medicine
Reference25 articles.
1. Investigation and treatment of repeated implantation failure following IVF-ET;Margalioth;Hum Reprod,2006
2. Assessment and treatment of repeated implantation failure (RIF);Simon;J Assist Reprod Genet,2012
3. Remedies for recurrent implantation failure;Zeyneloglu;Semin Reprod Med,2014
4. Assisted reproductive technologies and uterine factors influencing their success;Savasi;Minerva Ginecol,2013
5. Hysteroscopy prior to repeat embryo transfer may improve pregnancy outcomes for asymptomatic women with repeated implantation failure;Gao;J Obstet Gynaecol Res,2015
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