XAFS and HAXPES analyses of the oxidation state of a copper surface buried under a phenolic resin nanofilm-Reference-Cited by-同舟云学术

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XAFS and HAXPES analyses of the oxidation state of a copper surface buried under a phenolic resin nanofilm

Published:2022-07 Issue: Volume:589 Page:152967
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Izumi Atsushi,Shudo Yasuyuki,Kakara Takeshi

Publisher

Elsevier BV

Reference51 articles.

1. Reliability challenges for copper interconnects;Li;Microelectron. Reliab.,2004

2. Investigations on HCl contaminated Cu 200 mm wafers using parallel angle resolved XPS;Pelissier;Microelectron. Eng.,2009

3. Deposition of hydrogen chloride gas on copper wafer depending on humidity and HCl concentration;Tran;Microelectron. Eng.,2019

4. FT-IR study of the surface of copper oxide;Busca;J. Mol. Catal.,1987

5. Synthesis and properties of Cu2O quantum particles;Borgohain;J. Appl. Phys.,2002

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