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Thermal and stress studies of the 30.4nm Mo/Si multilayer mirror for the moon-based EUV camera

  • Published:2014-10 Issue: Volume:317 Page:902-907
  • ISSN:0169-4332
  • Container-title:Applied Surface Science
  • language:en
  • Short-container-title:Applied Surface Science

Author:

Li Yunpeng,Zhang Hongji,Wang Haifeng,He Fei,Wang Xiaodong,Liu Yang,Han Suli,Zheng Xin,Wang Xiaoduo,Chen Bin,Li Haibo,Chen Bo,Cao Jianlin

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference22 articles.

1. The Earth's Plasmasphere;Lemaire,1998

2. Moon-based EUV imaging of the Earth's Plasmasphere: model simulations;He;J. Geophys. Res. Space Phys.,2013

3. Optical design of moon-based earth's plasmaspheric extreme ultraviolet imager;Chen;Opt. Precision Eng.,2011

4. Long-term stability of Mg/SiC multilayers;Pelizzo;Opt. Eng.,2013

5. Performance, structure, and stability of SiC/Al multilayer films for extreme ultraviolet applications;Windt;Appl. Opt.,2009
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