Aqueous solution-processed In2O3 TFTs using focused plasma in gas mixtures-Reference-Cited by-同舟云学术

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Aqueous solution-processed In2O3 TFTs using focused plasma in gas mixtures

Published:2024-10 Issue: Volume:669 Page:160576
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Wang Xiao-Lin,Zhao Han-Lin,Shan Fei,Shi Shi-Kai,Lee Jae-Yun,Tarsoly Gergely^ORCID,Kim Sung-Jin^ORCID

Publisher

Elsevier BV

Reference53 articles.

1. Low-temperature, high-performance, solution-processed indium oxide thin film transistors;Han;J. Am. Chem. Soc.,2011

2. High performance solution-processed indium oxide thin film transistors;Kim;J. Am. Chem. Soc.,2008

3. High performance transparent a-IGZO thin film transistors with ALD-HfO2 Gate insulator on colorless polyimide substrate;Yu;IEEE Trans. Nanotechnol.,2020

4. High performance a-IGZO thin-film transistors with mf-PVD SiO2 as an etch-stop-layer;Nag;J. Soc. Inf. Disp.,2014

5. Design of highly stable tungsten-doped IZO thin film transistors with enhanced performance;Wan;IEEE Trans. Electron Devices,2018

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