Advanced film/substrate interface engineering for adhesion improvement employing time- and energy-controlled metal ion irradiation-Reference-Cited by-同舟云学术

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Advanced film/substrate interface engineering for adhesion improvement employing time- and energy-controlled metal ion irradiation

Published:2024-10 Issue: Volume:669 Page:160554
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Pshyk Oleksandr^ORCID,Wicher Bartosz^ORCID,Palisaitis Justinas,Hultman Lars,Greczynski Grzegorz^ORCID

Funder

NAWA

Carl Trygger Foundation for Scientific Research

Warsaw University of Technology

Swedish Research Council

Stiftelsen Olle Engkvist Byggmästare

ÅForsk

Knut and Alice Wallenberg Foundation

Swedish Energy Agency

Swedish Foundation for Strategic Research

Publisher

Elsevier BV

Reference45 articles.

1. Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion;Ehiasarian;J. Appl. Phys.,2007

2. Bond strength between TiN coating and microstructural constituents of a high speed steel determined by first principle calculations;Gsellmann;Acta Mater.,2022

3. Substrate ion etching in combined steered cathodic arc-UBM deposition system: effects on interface architecture, adhesion, and tool performance;Schönjahn;Surf. Eng.,2000

4. Enhanced adhesion through local epitaxy of transition-metal nitride coatings on ferritic steel promoted by metal ion etching in a combined cathodic arc/unbalanced magnetron deposition system;Schönjahn;J. Vac. Sci. Technol. A Vacuum, Surfaces, Film.,2000

5. Influence of preliminary metal-ion etching on the topography and mechanical behavior of TiAlN coatings on cemented carbides;Peng;Surf. Coatings Technol.,2022

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