Metastable Ge nanocrystalline in SiGe matrix for photodiode-Reference-Cited by-同舟云学术

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Metastable Ge nanocrystalline in SiGe matrix for photodiode

Published:2015-09 Issue: Volume:349 Page:387-392
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Ouyang Yao-Tsung,Su Chien-Hao,Chang Jenq-Yang,Cheng Shao-Liang,Lin Po-Chen,Wu Albert T.

Funder

National Research Program for Nanoscience and Technology of Taiwan

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference30 articles.

1. Silicon-based semiconductor heterostructures: column IV bandgap engineering

2. High-speed monolithically integrated silicon optical receiver fabricated in 130-nm CMOS technology

3. Influence of excitation frequency, temperature, and hydrogen dilution on the stability of plasma enhanced chemical vapor deposited a-Si:H

4. Characterization of intrinsic amorphous silicon layers for solar cells prepared at extremely high rates by atmospheric pressure plasma chemical vapor deposition

5. Study of pm-SiGe:H thin films for p–i–n devices and tandem solar cells

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Organic-inorganic PTAA-SiGe transparent optical materials performance analysis for photo device applications;Optical Materials;2024-01

2. Metaheuristic-based decision maker framework for the development of multispectral IGZO thin-film phototransistors;Journal of Science: Advanced Materials and Devices;2022-03

3. Formation of nanocrystalline SiGe in Polycrystalline-Ge/Si thin film without any metal induced crystallization;AIP Conference Proceedings;2017

4. Si1−xGex photodiode with segregated Ge nanocrystals;Materials Letters;2016-12

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