Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition-Reference-Cited by-同舟云学术

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Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition

Published:2017-12 Issue: Volume:425 Page:781-787
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Kim Kangsik,Oh Il-Kwon,Kim Hyungjun,Lee Zonghoon

Funder

Industrial Strategic Technology Development Program

Ministry of Knowledge Economy (MKE, Korea)

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference66 articles.

1. Improved surface chemistries, thin film deposition techniques, and stamp designs for nanotransfer printing;Menard;Langmuir,2004

2. Recent Advances in Atomic Layer Deposition;Dasgupta;Chem. Mater.,2016

3. Ionized physical vapor deposition (IPVD): A review of technology and applications;Helmersson;Thin Solid Films,2006

4. Plasma-Assisted atomic layer deposition: basics, opportunities, and challenges;Profijt;J. Vac. Sci. Technol. A,2011

5. In situ control of oxygen vacancies in TiO2 by atomic layer deposition for resistive switching devices;Park;Nanotechnology,2013

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3. Preparation of Remote Plasma Atomic Layer-Deposited HfO2 Thin Films with High Charge Trapping Densities and Their Application in Nonvolatile Memory Devices;Nanomaterials;2023-06-01

4. Improved interface quality of atomic-layer-deposited ZrO2 metal-insulator-metal capacitors with Ru bottom electrodes;Thin Solid Films;2020-05

5. Sacrificial hardmask ALD with hydrogen peroxide: comparative study of low temperature growth and film characteristics for TiO2 and Al2O3;Advances in Patterning Materials and Processes XXXVII;2020-03-23

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