Oxygen plasma etching of fused silica substrates for high power laser optics-Reference-Cited by-同舟云学术

Oxygen plasma etching of fused silica substrates for high power laser optics

Published:2018-09 Issue: Volume:453 Page:477-481
ISSN:0169-4332
Container-title:Applied Surface Science
language:en
Short-container-title:Applied Surface Science

Author:

Abromavičius Giedrius,Juodagalvis Tomas,Buzelis Rytis,Juškevičius Kęstutis,Drazdys Ramutis,Kičas Simonas

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference32 articles.

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2. Relationship between subsurface damage and surface roughness of optical materials in grinding and lapping processes;Li;J. Mater. Process. Technol.,2008

3. Subsurface damage in optical substrates;Shena;Optik,2005

4. J. Neauport, D. Valla, J. Duchesne, P. Bouchut, L. Lamaignere, J. Bigarre, N. Daurios, Building High-Damage-Threshold Surfaces at 351 nm, vol. 5252, SPIE, 2004.

5. J.F. DeFord, M.R. Kozlowski, Modeling of Electric-Field Enhancement at Nodular Defects in Dielectric Mirror Coatings, vol. 1848, SPIE, 1993.

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