Simple and facile synthesis of single-crystal CeO2 abrasives and its highly efficient removal mechanism on SiO2 film

Author:

Wang LiORCID,Ren GaoyuanORCID,Xie Wenxiang,Zhang Jingwei,Pan DengORCID,Wang Shudong

Funder

Chinese Academy of Sciences Dalian Institute of Chemical Physics

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Surfaces and Interfaces,General Physics and Astronomy,General Chemistry

Reference46 articles.

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4. Chemical effect on the material removal rate in the CMP of silicon wafers;Wang;Wear,2011

5. Preparation of spherical ceria coated silica nanoparticle abrasives for CMP application;Peedikakkandy;Appl. Surf. Sci.,2015

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