Optical lithography—present and future challenges

Author:

Lin Burn J.

Publisher

Elsevier BV

Subject

General Physics and Astronomy

Reference15 articles.

1. Where is the lost resolution?;Lin;Proc. SPIE,1986

2. Quarter- and sub-quarter micrometer optical lithography;Lin;ECS,1991

3. The k3 coefficient in non-paraxial λ/NA scaling equations for resolution, depth-of-focus, and immersion lithography;Lin;J. Microlithography, Microfabrication, and Microsystems,2002

4. Depth of focus in multi-layered media—a long-neglected phenomenon aroused by immersion lithography;Lin;J. Microlithography, Microfabrication, and Microsystems,2004

5. Full-field exposure tools for immersion lithography;Owa;Proc. SPIE,2005

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