A comparative study of gas-phase ion/molecule reactions in Si(OCH3)4 and Si(OC2H5)4-Reference-Cited by-同舟云学术

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A comparative study of gas-phase ion/molecule reactions in Si(OCH3)4 and Si(OC2H5)4

Published:1997-11 Issue: Volume:165-166 Page:83-95
ISSN:0168-1176
Container-title:International Journal of Mass Spectrometry and Ion Processes
language:en
Short-container-title:International Journal of Mass Spectrometry and Ion Processes

Author:

da Silva Maria L.P.,Riveros JoséM.

Publisher

Elsevier BV

Subject

Spectroscopy

Reference26 articles.

1. Sol-Gel Science;Brinker,1990

2. Chemical Vapor Deposition for Microelectronics;Sherman,1987

3. Model studies of dielectric thin film growth: Chemical vapor deposition of SiO2

4. Silicon Dioxide Deposition by Atmospheric Pressure and Low‐Temperature CVD Using TEOS and Ozone

5. Relative stabilities of tetramethyl orthosilicate and tetraethyl orthosilicate in the gas phase

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2. Sequential Methyl–Fluorine Exchange Reactions of Siloxide Ions in the Gas Phase;Angewandte Chemie International Edition;2012-07-10

3. Sequential Methyl–Fluorine Exchange Reactions of Siloxide Ions in the Gas Phase;Angewandte Chemie;2012-07-10

4. The Gas-Phase Alcoholysis of Protonated Homoleptic Alkoxysilanes;European Journal of Mass Spectrometry;2010-02-01

5. Gas-phase solvolysis type reactions of SiCl3+ cations;Química Nova;2010

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