Investigation of the projectile atomic number influence to the total sputtering yield in the keV energy region-Reference-Cited by-同舟云学术

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Investigation of the projectile atomic number influence to the total sputtering yield in the keV energy region

Published:2008-01 Issue:1 Volume:266 Page:49-53
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

Bundaleski N.

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference14 articles.

1. Theory of Sputtering. I. Sputtering Yield of Amorphous and Polycrystalline Targets

2. Energy dependence of the ion-induced sputtering yields of monatomic solids

3. Preferential sputtering effects in thin film processing

4. N. Bundaleski, G. Gligorić, Z. Ristić, S. Petrović, Contributed papers of the 23rd SPIG, Kopaonik, Serbia, August 28th–September 1st, 2006, p. 219.

5. Trends in sputter yield data in the film deposition regime

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Preferential sputtering of Ar ion processing SiO2mirror;6th International Symposium on Advanced Optical Manufacturing and Testing Technologies: Advanced Optical Manufacturing Technologies;2012-10-16

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