Spectroscopy of highly charged ions for extreme ultraviolet lithography-Reference-Cited by-同舟云学术

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Spectroscopy of highly charged ions for extreme ultraviolet lithography

Published:2017-10 Issue: Volume:408 Page:3-8
ISSN:0168-583X
Container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
language:en
Short-container-title:Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms

Author:

O'Sullivan Gerry,Dunne Padraig,Higashiguchi Takeshi,Kos Domagoj,Maguire Oisín,Miyazaki Takanori,O'Reilly Fergal,Sheil John,Sokell Emma,Kilbane Deirdre

Funder

Science Foundation Ireland

Science Foundation Ireland International Co-operation Strategic Award

Irish Research Council

Marie Curie Actions ELEVATE

Education, Audiovisual and Cultural Executive Agency

Ministry of Education, Culture, Science and Technology

Publisher

Elsevier BV

Subject

Instrumentation,Nuclear and High Energy Physics

Reference49 articles.

1. Properties of broadband depth-graded multilayer mirrors for EUV optical systems

2. Proc;van den Brink,2006

3. Laser wavelength dependence of extreme ultraviolet light and particle emissions from laser-produced lithium plasmas

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