Systematic investigations of low energy Ar ion beam sputtering of Si and Ag
Author:
Publisher
Elsevier BV
Subject
Instrumentation,Nuclear and High Energy Physics
Reference24 articles.
1. Stress relaxation and optical characterization of TiO2 and SiO2 films grown by dual ion beam deposition
2. Sputtering studies with the Monte Carlo Program TRIM.SP
3. Angular-resolved energy distribution of secondary ions emitted from a silicon target sputtered by a xenon ion beam
4. Angular resolved energy distribution of secondary ions emitted from a silicon target sputtered by rare gas ions under oblique incidence
5. Angular and energy dependencies of secondary ion emission from polycrystalline and single-crystal surfaces
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