Determination of deposition velocity onto a wafer for particles in the size range between 0.03 and 0.8 μm-Reference-Cited by-同舟云学术

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Determination of deposition velocity onto a wafer for particles in the size range between 0.03 and 0.8 μm

Published:1989-01 Issue:7 Volume:20 Page:787-796
ISSN:0021-8502
Container-title:Journal of Aerosol Science
language:en
Short-container-title:Journal of Aerosol Science

Author:

Otani Yoshio,Emi Hitoshi,Kanaoka Chikao,Kato Kaoru

Publisher

Elsevier BV

Subject

Pollution,Atmospheric Science,Fluid Flow and Transfer Processes,Mechanical Engineering,Environmental Engineering

Reference13 articles.

1. Proceedings of the 5th Symposium on Aerosol Science and Technology;Chirifu,1987

2. A direct method for studying particle deposition onto solid surfaces

3. Heat and Mass Transfer;Eckert,1959

4. Proceedings of the 6th Symposium on Aerosol Science and Technology;Fujii,1988

5. Proceedings of the 32nd Annual Technical Meeting;Hayakawa,1986

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