Comparison of focused ion beam and laser techniques for optical mask repair-Reference-Cited by-同舟云学术

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Comparison of focused ion beam and laser techniques for optical mask repair

Published:1987-12 Issue:1-4 Volume:6 Page:597-603
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Heard P.J.,Prewett P.D.,Lawes R.A.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference7 articles.

1. Focused ion beam repair techniques for clear and opaque defects in masks

2. MicroTrim Data Sheet, Ion Beam Systems Ltd, Abingdon, Oxon.

3. Liquid metal source of gold ions

4. Dunn, G.J. and Kaufmann, H. Private Communication.

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Fib repair of reticle defects with antistaining - effects on optical lithography from g-line to duv;Microelectronic Engineering;1994-01

2. Future developments for optical mask technology;Microelectronic Engineering;1994-01

3. Effects of focused ion beam reticle repair on optical lithography at i-line and deep ultraviolet wavelengths;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1993-11

4. Focused ion beam repair: staining of photomasks and reticles;Journal of Physics D: Applied Physics;1993-07-14

5. Gallium staining in FIB repair of photomasks;Microelectronic Engineering;1993-04

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