Redeposition in ion milling-Reference-Cited by-同舟云学术

Redeposition in ion milling

Published:1987-01 Issue:1 Volume:7 Page:91-101
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Müller K.P.,Pelka J.

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference16 articles.

1. Fabrication of submicron gold absorber patterns for X-ray masks by ion-beam-etching;Schneider-Gmelch,1985

2. Influence of sputter effects on the resolution in X-ray mask repair;Betz,1986

3. Deterministic models of ion erosion, reflection and redeposition;Smith;Vacuum,1984

4. Secondary effect in ion milling;Moreno-Marin;J. Vac. Sci. Technol. B,1986

5. Simulation of focused ion beam milling;Müller;Microelectronic Engineering,1986

Cited by 13 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Scalable Non‐Volatile Tuning of Photonic Computational Memories by Automated Silicon Ion Implantation;Advanced Materials;2023-12-07

2. Frequency Scaling Millimeter Wave Acoustic Resonators using Ion Beam Trimmed Lithium Niobate;2023 Joint Conference of the European Frequency and Time Forum and IEEE International Frequency Control Symposium (EFTF/IFCS);2023-05-15

3. Free-standing tantalum pentoxide waveguides for gas sensing in the mid-infrared;Optical Materials Express;2021-08-23

4. Investigation for Low-Rate Fenceless Al Etching Applied in Fabrication of Superconducting Circuits;IEEE Transactions on Applied Superconductivity;2020-10

5. Metallic coplanar resonators optimized for low-temperature measurements;Journal of Physics D: Applied Physics;2016-09-08