An inorganic resist technology and its applications to LSI fabrication processes-Reference-Cited by-同舟云学术

An inorganic resist technology and its applications to LSI fabrication processes

Published:1984-12 Issue:4 Volume:2 Page:281-298
ISSN:0167-9317
Container-title:Microelectronic Engineering
language:en
Short-container-title:Microelectronic Engineering

Author:

Utsugi Yasushi,Yoshikawa Akira,Kitayama Toyoki

Publisher

Elsevier BV

Subject

Electrical and Electronic Engineering,Surfaces, Coatings and Films,Condensed Matter Physics,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials

Reference14 articles.

1. Photoprocessing and lithographic application;Mizushima,1982

2. High resolution, steep profile resist patterns;Moran;J. Vac. Sci. Technol.,1979

3. New application of Se-Ge glasses to silicon microfabrication technology;Nagai;Appl. Phys. Lett.,1976

4. A novel inorganic photoresist utilizing Ag photodoping in Se-Ge glass films;Yoshikawa;Appl. Phys. Lett.,1976

5. Proceedings Symposium on Inorganic Resist Systems,1982

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