Plasma-assisted deposition techniques for hard coatings-Reference-Cited by-同舟云学术

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Plasma-assisted deposition techniques for hard coatings

Published:1990-01 Issue:7-9 Volume:41 Page:2190-2195
ISSN:0042-207X
Container-title:Vacuum
language:en
Short-container-title:Vacuum

Author:

Bunshah R.F.,Deshpandey C.

Publisher

Elsevier BV

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,Instrumentation

Reference25 articles.

1. Plasma assisted physical vapor deposition processes: A review

2. Deposition Technologies for Films and Coatings;Thornton,1982

3. Deposition Technologies for Films and Coatings;Bonifield,1982

4. Plasma Deposition of Inorganic Thin Films

5. Thin Film Processes;Hollahan,1978

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Coating Technologies;Schott Series on Glass and Glass Ceramics;2003

2. Adhesion of wear resistant hard coatings to steel substrates;Tribology International;1997-07

3. A combined MW/ECR-PACVD apparatus for the deposition of diamond and other hard coatings;Surface and Coatings Technology;1995-09

4. New plasma‐assisted deposition technique using helicon activated reactive evaporation;Review of Scientific Instruments;1995-04

5. Investigation of silicon transport in the neutral background of a plasma activated reactive evaporation system;Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures;1995-03

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