A controlled growth of WNx and WCx thin films prepared by atomic layer deposition-Reference-Cited by-同舟云学术

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A controlled growth of WNx and WCx thin films prepared by atomic layer deposition

Published:2016-04 Issue: Volume:168 Page:218-222
ISSN:0167-577X
Container-title:Materials Letters
language:en
Short-container-title:Materials Letters

Author:

Kim Jun Beom,Jang Byeonghyeon,Lee Hyun-Jung,Han Won Seok,Lee Do-Joong,Lee Han-Bo-Ram,Hong Tae Eun,Kim Soo-Hyun

Funder

National Research Foundation of Korea

Ministry of Education, Science and Technology

Korea Basic Science Institute (KBSI)

Publisher

Elsevier BV

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science

Reference19 articles.

1. Atomic Layer Deposition for Semiconductors;Kim,2014

2. Structural and electrical characteristics of W–N thin films prepared by reactive rf sputtering

3. Thermal Stability of Sputtered Tungsten Carbide as Diffusion Barrier for Copper Metallization

4. Characterization of WF[sub 6]/N[sub 2]/H[sub 2] plasma enhanced chemical vapor deposited W[sub x]N films as barriers for Cu metallization

5. Low temperature chemical vapor deposition of tungsten carbide for copper diffusion barriers

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1. Atomic Layer Deposition of Molybdenum Carbide Thin Films;Advanced Materials Interfaces;2024-07

2. Fabrication of TiN coatings using superimposed HiPIMS and MF technique: Effect of target poisoning ratios and MF/HiPIMS pulse on-time ratio;Surface and Coatings Technology;2024-02

3. On the horizon of greener pathways to travel into a greener future portal: Green MXenes, environment-friendly synthesis, and their innovative applications;Journal of Cleaner Production;2024-01

4. Fluorine-free Plasma Enhanced Atomic Layer Deposited Ultrathin Tungsten Nitride Thin Films for Dual Diffusion Barrier Performance;ACS Applied Nano Materials;2023-11-17

5. One-step, in situ formation of WN-W2C heterojunctions implanted on N doped carbon nanorods as efficient oxygen reduction catalyst for metal-air battery;Nano Research;2023-03-14

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