Construction and characterization of 3D hollow Ag/AgBr/Bi4Ti3O12 heterojunction photocatalyst: Mechanism investigation of rhodamine B degradation
Author:
Publisher
Elsevier BV
Reference17 articles.
1. Environmental Applications of Semiconductor Photocatalysis
2. H2 or O2 Evolution from Aqueous Solutions on Layered Oxide Photocatalysts Consisting of Bi3+ with 6s2 Configuration and d0 Transition Metal Ions
3. Constructing Bi4Ti3O12/CdS heterostructure by Atomic Layer Deposition for increased photocatalytic performance through suppressed electron/hole recombination
4. Ag NPs modified plasmonic Z-scheme photocatalyst Bi4Ti3O12/Ag/Ag3PO4 with improved performance for pollutants removal under visible light irradiation
Cited by 15 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. Synergizing photocatalysis with Aurivillius-phase Bi4Ti3O12: current insights and emerging trends;Journal of Materials Chemistry A;2025
2. Recent progresses in improving the photocatalytic potential of Bi4Ti3O12 as emerging material for environmental and energy applications;Journal of Industrial and Engineering Chemistry;2024-10
3. Silver Nps assembled lithium niobate Ag@LiNbO3 photocatalysts for visible light-assisted pharmaceutical degradation;Journal of Photochemistry and Photobiology A: Chemistry;2024-08
4. A novel plasmonic Z-scheme photocatalyst for solar-light-driven degradation of naphthalene in seawater: Degradation pathways and mechanism insight;Journal of Environmental Chemical Engineering;2024-06
5. All-solid-state Z-scheme AgBr/Bi2CrO6 heterostructure with metallic Ag as a charge transfer bridge for boosted charge transfer and photocatalytic performances;Applied Surface Science;2024-05
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.7亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2025 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3