1. P. Dold, A. Cröll, K.W. Benz, Conference Proceedings of the third Institute Symposium on Electromagnetic Processing of Materials, Nagoya, Japan, 2000, p. 259.
2. G. Raming, A. Muižnieks, A. Mühlbauer, Proceedings of the Intitute Scientific Colloquium Modeling of Material Processing, Riga, May 28–29, 1999, p. 24.
3. M. Kimura, K. Yoshizawa, H. Yamagishi, Proceedings of the fourth International Symposium on High Purity Silicon, Vol. 96-13, 1996, p. 58.
4. Interface shape, heat transfer and fluid flow in the floating zone growth of large silicon crystals with the needle-eye technique
5. Analysis of the dopant segregation effects at the floating zone growth of large silicon crystals