Application of nitrogen in a cobalt-silicide-forming system-Reference-Cited by-同舟云学术

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Application of nitrogen in a cobalt-silicide-forming system

Published:1985-05 Issue:3-4 Volume:127 Page:313-322
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Ho K.T.,Nicolet M.-A.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference19 articles.

1. Retardation and suppression of nickel silicide formation by N+ implantation

2. The Nature of The Chemical Bonds;Pauling,1967

3. The Nature of The Chemical Bonds;Pauling,1967

4. Interactions in the Co/Si thin‐film system. I. Kinetics

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Nitrides;Ullmann's Encyclopedia of Industrial Chemistry;2000-06-15

2. Phase diagrams of the ternary systems Mn, Fe, Co, NiSiN;Journal of Solid State Chemistry;1987-10

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