A secondary ion mass spectometry study of the desorption mechanisms of F+ from a LiF surface bombarded with Ar+ and Ar2+

Author:

Thompson Patrick M.,Taylor James W.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference18 articles.

1. Secondary Ion Mass Spectrometry (SIMS IV);Williams,1984

2. Desorption Mass Spectrometry, Are SIMS and FAB the Same?;Colton,1985

3. The application of the SIMS technique to quantitive chemical analysis

4. Secondary Ion Mass Spectrometry (SIMS IV);Newbury,1984

5. Depth profiling by means of sims: Recent progress and current problems

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3. Resonant ion-stimulated desorption and low-energy proton-scattering study of interactions of hydrogen and oxygen with theSrTiO3(100)surface;Physical Review B;1999-08-15

4. Electronic effects in ion-stimulated desorption of positive halogen ions from semiconductor surfaces;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1995-06

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