Quantitative surface analysis using ion-induced secondary ion and photon emission-Reference-Cited by-同舟云学术

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Quantitative surface analysis using ion-induced secondary ion and photon emission

Published:1977-09 Issue:2 Volume:66 Page:423-435
ISSN:0039-6028
Container-title:Surface Science
language:en
Short-container-title:Surface Science

Author:

MacDonald R.J.,Martin P.J.

Publisher

Elsevier BV

Subject

Materials Chemistry,Surfaces, Coatings and Films,Surfaces and Interfaces,Condensed Matter Physics

Reference24 articles.

1. Thermodynamic approach to the quantitative interpretation of sputtered ion mass spectra

2. An ion beam spectrochemical analyser with application to the analysis of silicate minerals

3. Fundamental Studies on Quantitative Analysis in Ion Probe Microanalyzer

4. Quantitative analysis of low alloy steels by secondary ion mass spectrometry

Cited by 28 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Ionoluminescence;Luminescence of Solids;1998

2. Ion-induced photon emission of metals;Progress in Surface Science;1997-02

3. Ion-Induced Photon Emission of Materials and Possibilities of its Application for Surface Diagnostics;Application of Particle and Laser Beams in Materials Technology;1995

4. Ion-photon emission of CuZn alloy;Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms;1992-04

5. Charged and excited states of sputtered atoms;Topics in Applied Physics;1991

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