Influence of deposition pressure on microstructure, mechanical and electrical properties of niobium thin films-Reference-Cited by-同舟云学术

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Influence of deposition pressure on microstructure, mechanical and electrical properties of niobium thin films

Published:2024-09 Issue: Volume:805 Page:140503
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Rao P.N.^ORCID,Swami M.K.,Ghosh Amrit,Jangir R.^ORCID,Rai S.K.^ORCID

Publisher

Elsevier BV

Reference58 articles.

1. Properties of titanium thin films deposited by dc magnetron sputtering;Jeyachandran;Mater. Sci. Eng.: A,2006

2. Physical and electrical properties of molybdenum thin films grown by DC magnetron sputtering for photovoltaic application;Rashid;Results Phys.,2019

3. Nanomaterials by design: a review of nanoscale metallic multilayers;Sáenz-Trevizo;Nanotechnology,2020

4. Length-scale-dependent deformation mechanisms in incoherent metallic multilayered composites;Misra;Acta Mater.,2005

5. Shear stress-driven refreshing capability of plastic deformation in nanolayered metals;Yan;Phys. Rev. Lett.,2013

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