Atomic Vapor Depositions of Ti–Ta–O thin films for Metal–Insulator–Metal applications-Reference-Cited by-同舟云学术

Atomic Vapor Depositions of Ti–Ta–O thin films for Metal–Insulator–Metal applications

Published:2011-03 Issue:11 Volume:519 Page:3831-3834
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Lukosius M.,Kaynak C. Baristiran,Wenger Ch.,Ruhl G.,Rushworth S.,Baumann P.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference25 articles.

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