Effect of chemical activity of bulk and pad materials on the redeposition layer during polishing of glass-Reference-Cited by-同舟云学术

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Effect of chemical activity of bulk and pad materials on the redeposition layer during polishing of glass

Published:2021-10 Issue: Volume:735 Page:138876
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Cai Chao^ORCID,Liu Yunxia,He Xiang,Zhao Heng,Wang Gang,Huang Jinyong,Hu Qing,Xie Lei,Ma Ping,Yan Dingyao,Yin Liangjun

Funder

National Natural Science Foundation of China

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference20 articles.

1. Modeling Interfacial Glass-Water Reactions: Recent Advances and Current Limitations;Pierce;International Journal of Applied Glass Science,2014

2. Surface hydration and nanoindentation of silicate glasses;Tadjiev;Journal of Non-Crystalline Solids,2010

3. Insight into silicate-glass corrosion mechanisms;Cailleteau;Nature Materials,2008

4. Origin and distribution of redeposition layer in polished fused silica;Wang;Optical Engineering,2015

5. Chemistry and Formation of the Beilby Layer During Polishing of Fused Silica Glass;Suratwala;Journal of the American Ceramic Society,2015

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of subsurface impurity defects on laser damage resistance of beam splitter coatings;High Power Laser Science and Engineering;2023

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