Double layer SiNx:H films for passivation and anti-reflection coating of c-Si solar cells-Reference-Cited by-同舟云学术

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Double layer SiNx:H films for passivation and anti-reflection coating of c-Si solar cells

Published:2011-08 Issue:20 Volume:519 Page:6887-6891
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Ko Jisoo,Gong Daeyeong,Pillai Krishnakumar,Lee Kong-Soo,Ju Minkyu,Choi Pyungho,Kim Kwang-Ryul,Yi Junsin,Choi Byoungdeog

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference24 articles.

1. Optimised antireflection coatings for planar silicon solar cells using remote PECVD silicon nitride and porous silicon dioxide

2. A comparative study of SiO2 deposited by PECVD and thermal method as passivation for multicrystalline silicon solar cells

3. Angle-dependent XPS analysis of silicon nitride film deposited on screen-printed crystalline silicon solar cell

4. Comparison of TiO2 and other dielectric coatings for buried-contact solar cells: a review

5. 25th Photovoltaic Specialists Conference, Washington, U.S.A., May 13–17, 1996;Aberle,1996

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