Free carrier plasma edge and plasmonic excitations in heavily doped surface grated n-type Si-Reference-Cited by-同舟云学术

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Free carrier plasma edge and plasmonic excitations in heavily doped surface grated n-type Si

Published:2023-04 Issue: Volume:771 Page:139751
ISSN:0040-6090
Container-title:Thin Solid Films
language:en
Short-container-title:Thin Solid Films

Author:

Mamedov N.T.,Alizade E.H.,Bayramov A.H.,Tavkhelidze A.,Mammadov D.A.,Jalilli J.N.,Aliyeva Y.N.,Jahangirli Z.A.,Jangidze L.,Kitoshvili N.

Publisher

Elsevier BV

Subject

Materials Chemistry,Metals and Alloys,Surfaces, Coatings and Films,Surfaces and Interfaces,Electronic, Optical and Magnetic Materials

Reference46 articles.

1. The recent developments of soft x-ray interference lithography in SSRF;Zhao;Int. J. Extrem Manuf.,2020

2. Composition modulation in one-dimensional and two-dimensional chalcogenide semiconductor nanostructures;Li;Chem. Soc. Rev.,2018

3. Formation of periodic nanoridge patterns by ultrashort single pulse UV laser irradiation of gold;Blumenstein;Nanomaterials,1998

4. Geometry-induced electron doping in periodic semiconductor nanostructures;Tavkhelidze;Phys. E,2014

5. Comparative simulations of conductive nitrides as alternative plasmonic nanostructures for solar cells;David;Energies,2021

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Comparative studies of GaN, n-GaN and n+-GaN contact layers on GaN/c-Al2O3 virtual substrates synthesized by PA MBE;Optical Materials;2024-06

2. Plasmonic Ring Resonator Sensor with High Figure of Merit and Sensitivity Using Degenerate N-Doped Silicon for SPP Excitation;Plasmonics;2024-01-25

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