Novel highly-efficient and dress-free polishing technique with plasma-assisted surface modification and dressing
Author:
Funder
Japan Society for the Promotion of Science
JST Adaptable and Seamless Technology Transfer Program Through Target-driven R and D
Publisher
Elsevier BV
Subject
General Engineering
Reference26 articles.
1. Chemical mechanical planarization (CMP) of on-axis Si-face SiC wafer using catalyst nanoparticles in slurry;Zhou;Surf Coating Technol,2014
2. Chemical mechanical polishing of gallium nitride with colloidal silica;Aida;J Electrochem Soc,2011
3. Method for forming isolation layer of semiconductor device;Kim,2002
4. Plasma assisted polishing of single crystal SiC for obtaining atomically flat strain-free surface;Yamamura;CIRP Annals,2011
5. Plasma-assisted polishing of gallium nitride to obtain a pit-free and atomically flat surface;Deng;CIRP Annals,2015
Cited by 13 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Material removal and tool path ripple error of bonnet polishing using pads with different groove patterns;The International Journal of Advanced Manufacturing Technology;2024-05-08
2. JSPE Affiliate News;Journal of the Japan Society for Precision Engineering;2024-05-05
3. Advance Chemical Mechanical Polishing Technique for Gallium Nitride Substrate;Advanced Materials Interfaces;2024-03-04
4. Research on a Compensation Correction Algorithm for the Removal Function of Atmospheric-Pressure Plasma Processing;Plasma Chemistry and Plasma Processing;2024-02-27
5. Improved the laser-induced damage threshold of fused silica by atmospheric pressure plasma processing;Pacific-Rim Laser Damage 2023: Optical Materials for High-Power Lasers;2023-12-23
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3